Spectra Research Corporation (SRC) in collaboration with Heidelberg Instruments invites you to an exclusive seminar and hands-on workshop focused on cutting-edge nanofabrication techniques and characterization methods for advanced nano and 2D material devices. Join industry-leading experts and researchers at McGill University to explore next-generation NanoFrazor capabilities and advanced AFM characterization methods.
Keynote Speakers:
Dr. Nicholas Hendricks
Innovation Manager, Heidelberg Instruments Nano, Zürich, Switzerland
Dr. Nicholas specializes in next-generation nanolithography, with extensive experience in polymer science and advanced fabrication techniques. His expertise includes direct-write lithography methods for nanoelectronics, photonics, molecular sensing, and quantum computing applications.
Talk Highlights:
Overview of Thermal Scanning Probe Lithography (t-SPL) with Heidelberg’s NanoFrazor for precise fabrication of nano and 2D material devices
Benefits of NanoFrazor for direct-write nanolithography without charged particle damage
Application examples including nanowires, quantum devices, and 2D material electronics
Latest advancements: parallelized large-area patterning and automated nanofabrication
Sean Chen
Master’s Student, Department of Physics, McGill University
Working under Prof. Peter Grutter, Sean focuses on electrical properties of two-dimensional materials and optoelectronic devices, employing atomic force microscopy techniques such as Kelvin Probe Force Microscopy to study persistent photoconductivity in transition metal dichalcogenides.
Talk Highlights:
Understanding persistent photoconductivity in WS₂ flakes using Kelvin Probe Force Microscopy
Time-resolved studies of surface potential and photocurrent
Investigations on the effects of illumination intensity, wavelength, doping, and flake thickness
Hands-On Demo: NanoFrazor – Thermal Scanning Probe Lithography
Experience a live demonstration of Heidelberg’s 
NanoFrazor Thermal Scanning Probe Lithography System
, showcasing its unique capabilities including:
High-resolution, markerless overlay and sub-2 nm vertical precision
Real-time in-situ imaging
Versatile modular platform suitable for quantum devices, photonics, biotechnology, and MEMS
Integrated Direct Laser Sublimation (DLS) for high-speed micro patterning
Who Should Attend?
Researchers and professionals in nanoelectronics, semiconductor fabrication, and materials science
Graduate students in physics, chemistry, and engineering
Industry professionals involved in advanced electronic device fabrication and characterization
Information Source: Spectra Research Corp | eventbrite

La Cote-de-Gaspe

Canada

Saint-Maurice-de-l'Echouerie

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Time:	Jun 20, 2025 (UTC-4) ENDED
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